Application
Description
Physical Vapor Deposition (PVD). In a sealed chamber, vacuum pumps create a stable vacuum; a gas supply introduces inert gas (typically Ar). High voltage discharges across the magnetron target surface, generating plasma. Ionized gas ions are attracted to the negatively biased target surface and bombard it, sputtering target atoms which travel downward and deposit on the substrate. The entire deposition occurs through physical collisions between Ar ions and the target — hence “Physical Vapor Deposition”.











